Effects of substrate temperature and post-deposition anneal on properties of evaporated cadmium telluride films

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dc.contributor.authorBacaksız, E.
dc.contributor.authorBasol, B. M.
dc.contributor.authorAltunbaş, M.
dc.contributor.authorNovruzov, V.
dc.contributor.authorYanmaz, E.
dc.contributor.authorNezir, S.
dc.date.accessioned2020-06-25T17:44:01Z
dc.date.available2020-06-25T17:44:01Z
dc.date.issued2007
dc.descriptionBasol, Bulent/0000-0002-7691-1113
dc.description.abstractThe effects of substrate temperature and post-deposition heat treatment steps on the morphology, structural, optical and electrical properties of thin film CdTe layers grown by vacuum evaporation were investigated. Scanning electron microscopy and X-ray diffraction (XRD) techniques were employed to study the structural changes. It was observed that the grain sizes and morphologies of as-deposited layers were similar for substrate temperatures of - 173 degrees C and - 73 degrees C. However, CdTe films produced at a substrate temperature of 27 degrees C had substantially larger grain size and clearly facetted morphology. Annealing at 200-400 degrees C in air did not cause any appreciable grain growth in any of the films irrespective of their growth temperature. However, annealing at 400 degrees C reduced faceting in all cases and initiated fusing between grains. XRD studies showed that this behavior after annealing at 400 degrees C coincided with an onset of a degree of randomization in the originally strong (I 11) texture of the as-grown layers. Optical band gap measurements showed sharpening of the band-edge upon annealing at 400 degrees C and a band gap value in the range of 1.46-1.49 eV Resistivity measurements indicated that annealing at 400 degrees C in air forms a highly resistive compensated CdTe film. All results point to 400 degrees C to be a critical annealing temperature at which optical, structural and electrical properties of CdTe layers start to change. (c) 2006 Elsevier B.V. All rights reserved.en_US
dc.identifier.citationclosedAccessen_US
dc.identifier.doi10.1016/j.tsf.2006.08.026
dc.identifier.endpage3084en_US
dc.identifier.issn0040-6090
dc.identifier.issue5en_US
dc.identifier.scopus2-s2.0-33845953989
dc.identifier.scopusqualityQ2
dc.identifier.startpage3079en_US
dc.identifier.urihttps://doi.org10.1016/j.tsf.2006.08.026
dc.identifier.urihttps://hdl.handle.net/20.500.12587/3980
dc.identifier.volume515en_US
dc.identifier.wosWOS:000243868900038
dc.identifier.wosqualityQ1
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherElsevier Science Saen_US
dc.relation.ispartofThin Solid Films
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanıen_US
dc.rightsinfo:eu-repo/semantics/closedAccessen_US
dc.subjectcadmium tellurideen_US
dc.subjectevaporationen_US
dc.subjectoptical propertiesen_US
dc.subjectannealingen_US
dc.subjectX-ray diffractionen_US
dc.subjectscanning electorn microscopyen_US
dc.titleEffects of substrate temperature and post-deposition anneal on properties of evaporated cadmium telluride filmsen_US
dc.typeArticle

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