Low-loss as-grown germanosilicate layers for optical waveguides
Yükleniyor...
Tarih
2003
Yazarlar
Dergi Başlığı
Dergi ISSN
Cilt Başlığı
Yayıncı
Amer Inst Physics
Erişim Hakkı
info:eu-repo/semantics/openAccess
Özet
We report on systematic growth and characterization of low-loss germanosilicate layers for use in optical waveguide technology. The films were deposited by plasma-enhanced chemical vapor deposition technique using silane, germane, and nitrous oxide as precursor gases. Fourier transform infrared spectroscopy was used to monitor the compositional properties of the samples. It was found that addition of germane leads to decreasing of N-H- and O-H-related bonds. The propagation loss values of the planar waveguides were correlated with the decrease in the hydrogen-related bonds of the as-deposited waveguides and resulted in very low values, eliminating the need for high-temperature annealing as is usually done. (C) 2003 American Institute of Physics.
Açıklama
Ay, Feridun/0000-0003-2255-1156
Anahtar Kelimeler
Kaynak
Applied Physics Letters
WoS Q Değeri
Q1
Scopus Q Değeri
Q1
Cilt
83
Sayı
23
Künye
Ay,F., Aydinli, A., Agan S.(2003). Low-loss as-grown germanosilicate layers for optical waveguides. Appl. Phys. Lett. 8 December, 83 (23): 4743–4745.
